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Thickness of the Modified Polymer Layer Formed by Low-Temperature Plasma Treatment
- Authors: Gilman A.B.1, Piskarev M.S.1, Kuznetsov A.A.1
-
Affiliations:
- Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences
- Issue: Vol 57, No 5 (2023)
- Pages: 400-403
- Section: PLASMA CHEMISTRY
- URL: https://rjraap.com/0023-1193/article/view/661482
- DOI: https://doi.org/10.31857/S0023119323050030
- EDN: https://elibrary.ru/LIFROI
- ID: 661482
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Abstract
Experimental data presented in the literature on the depth of processing of polymer films using low-temperature plasma are considered. Changes in the chemical composition and structure along the depth of the samples have been studied using the modern experimental techniques of X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and transmission electron microscopy; precision etching was carried
out with an Ar+2500 cluster beam; and the pit depth was measured by profilometry. It has been found that the thickness of the modified layer is ≤50 nm and depends relatively little on the polymer nature.
About the authors
A. B. Gilman
Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences
Email: plasma@ispm.ru
Moscow, 117393 Russia
M. S. Piskarev
Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences
Email: plasma@ispm.ru
Moscow, 117393 Russia
A. A. Kuznetsov
Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences
Author for correspondence.
Email: plasma@ispm.ru
Moscow, 117393 Russia
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